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T01100 - SEMI T11 - Specification for Marking of Hard Surface Reticle Substrates Revision:SEMI T11-0703 - Superseded but for most electronic-grade silicon

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Description

but for most electronic-grade silicon wafers in use today

SEMI M50-0923 (technical revision)

the volume sampled by a single probe is approximately 1011 cm3

The resistivity of a semiconductor material is an important materials acceptance requirement

as well as the MECHATROLINK public specification

T01100 - SEMI T11 - Specification for Marking of Hard Surface Reticle Substrates Revision:SEMI T11-0703 - Superseded but for most electronic-grade siliconThis Specification provides a symbology for marking hard surface reticle substrates within the edge exclusion area of the substrate. This Specification defines the geometric and spatial relationships and content (including error checking and correcting code) of square two dimensional, machine readable, Data Matrix symbols for pattern surface marking of resist coated 6 inch reticle substrates that comply with the specifications of SEMI P1. This

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